Dl. Peng et al., STRUCTURE AND MAGNETIC-PROPERTIES OF FE-CR-N SPUTTER-DEPOSITED FILMS, Journal of magnetism and magnetic materials, 172(1-2), 1997, pp. 41-52
Structure and magnetic properties of Fe-Cr-N ternary films prepared by
DC magnetron facing-target sputtering have been investigated by X-ray
diffraction (XRD), scanning electron microscopy (SEM), transmission e
lectron microscopy (TEM), vibrating sample magnetometry (VSM) and Moss
bauer effect. These films exhibit perpendicular magnetic anisotropy. W
e found that N-2-to-Ar flow ratio, Fe-Cr target area ratio and substra
te temperature during film preparation are the factors influencing the
anisotropy. Adjusting the chemical composition and deposition paramet
ers, we obtained saturation magnetization of 300-400 emu/cm(3) acid pe
rpendicular coercivity of 800-1100 Oe. XRD measurements show that the
films generally consist of the alpha-Fe(Cr) and gamma'-(Fe,Cr)(4)N-x(x
< 1) phases, and that the enhancement of perpendicular anisotropy is
always accompanied by a decrease in the grain size of alpha-Fe(Cr) pha
se and growth of the gamma'-(Fe,Cr)(4)N-x phase with a pronounced (200
) texture. The Mossbauer spectra show that the gamma'-(Fe,Cr)(4)N-x ph
ase is nonmagnetic at room temperature. Using the SEM and TEM, we foun
d that the nonmagnetic gamma'-(Fe,Cr)(4)N-x phase displays columnar gr
owth and that the small ferromagnetic alpha-Fe(Cr) grains of about 2-2
0 nm in diameter are located at grain boundaries of gamma'-(Fe,Cr)(4)N
-x grains. Shape anisotropy seems to play an important part in the per
pendicular magnetic anisotropy in these Fe-Cr-N films.