C. Fukushima et al., FORMATION OF ALPHA-MOLYBDENUM TRIOXIDE THIN-FILMS TO CONFIGURE LOW-DIMENSIONAL CONDUCTOR, Physica. B, Condensed matter, 239(1-2), 1997, pp. 56-58
Procedures of formation of alpha-molybdenum trioxide (alpha-MoO3) crys
tal films are introduced. The films show the (0 k 0) peaks of alpha-Mo
O3 in XRD results. Injection of hydrogen ion (30% of Mo atomic%) into
alpha-MoO3 gives drastic change in the temperature dependence of elect
rical resistance and its activation energy.