The preparation of magnesium fluoride (MgF2) thin films on silica glas
s substrates was studied by a trifluoroacetic acid (TFA) method using
trifluoroacetic acid as a fluorine source. The coating solution was pr
epared by stirring a mixture of magnesium ethoxide, isopropanol and TF
A. MgF2 thin films were obtained by heat-treatment of the slain-coated
films below 500 degrees C in air. Higher optical transmittance of the
films was observed as compared to the substrates. Field emission scan
ning electron microscope (FE-SEM) observation revealed a particle size
of less than 50 nm in the films. The formation process of MgF2 from t
rifluoroacetate gels was discussed according to the results of the the
rmal analysis of the gel. (C) 1997 Elsevier Science S.A.