An air-exposed polycrystalline nichrome (Ni/Cr) alloy was exposed to a
hydrogen-atom flux at room temperature and then sputtered with Ar+ fo
r 15 min. X-ray photoelectron spectroscopy (XPS) and ion scattering sp
ectroscopy (ISS) were used to examine the changes, which occur at the
surface of the sample during these treatments. The near-surface region
of the alloy initially consists primarily of nickel hydroxide and car
bon contamination. Small amounts of Na and Cl contaminants an also pre
sent on the surface, according to the ISS data. The amount of carbon c
ontamination and oxygen in the near-surface region is decreased by the
H-atom exposure, and the Ni and Cr concentrations are increased. The
hydroxyl groups are rapidly removed during the exposure to if atoms pr
esumably through formation of water molecules, which desorb. Ni(OH)(2)
, NiO, Ni-0, CrO2 and Cr-0 are present in the near-surface region afte
r the Ii-atom exposure. A subsequent 15-min, 1-keV Ar+ sputter removes
the remaining carbon, nearly all of the oxygen, as well as the Na and
Cl contaminants. The Ni is mostly metallic, and Cr is present as Cr-0
and CrO2. In previous studies, multiple ion-beam sputtering and annea
ling cycles were necessary to obtain this level of cleanliness. The pr
ocess using a H-atom beam flux provides an alternative and less time-c
onsuming method for cleaning Ni/Cr alloy surfaces. (C) 1997 Elsevier S
cience S.A.