STUDY OF A POLYCRYSTALLINE NI CR ALLOY .5. HYDROGEN-ATOM EXPOSURE/

Citation
Ws. Epling et al., STUDY OF A POLYCRYSTALLINE NI CR ALLOY .5. HYDROGEN-ATOM EXPOSURE/, Thin solid films, 304(1-2), 1997, pp. 273-277
Citations number
21
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
304
Issue
1-2
Year of publication
1997
Pages
273 - 277
Database
ISI
SICI code
0040-6090(1997)304:1-2<273:SOAPNC>2.0.ZU;2-D
Abstract
An air-exposed polycrystalline nichrome (Ni/Cr) alloy was exposed to a hydrogen-atom flux at room temperature and then sputtered with Ar+ fo r 15 min. X-ray photoelectron spectroscopy (XPS) and ion scattering sp ectroscopy (ISS) were used to examine the changes, which occur at the surface of the sample during these treatments. The near-surface region of the alloy initially consists primarily of nickel hydroxide and car bon contamination. Small amounts of Na and Cl contaminants an also pre sent on the surface, according to the ISS data. The amount of carbon c ontamination and oxygen in the near-surface region is decreased by the H-atom exposure, and the Ni and Cr concentrations are increased. The hydroxyl groups are rapidly removed during the exposure to if atoms pr esumably through formation of water molecules, which desorb. Ni(OH)(2) , NiO, Ni-0, CrO2 and Cr-0 are present in the near-surface region afte r the Ii-atom exposure. A subsequent 15-min, 1-keV Ar+ sputter removes the remaining carbon, nearly all of the oxygen, as well as the Na and Cl contaminants. The Ni is mostly metallic, and Cr is present as Cr-0 and CrO2. In previous studies, multiple ion-beam sputtering and annea ling cycles were necessary to obtain this level of cleanliness. The pr ocess using a H-atom beam flux provides an alternative and less time-c onsuming method for cleaning Ni/Cr alloy surfaces. (C) 1997 Elsevier S cience S.A.