THIN-LAYER DEPOSITION BY LASER-ABLATION -INDUSTRIAL POTENTIAL

Authors
BELOUET C CHAMBONNET D KELLER D VILLARD C
Citation
C. Belouet et al., THIN-LAYER DEPOSITION BY LASER-ABLATION -INDUSTRIAL POTENTIAL, Annales de physique, 22, 1997, pp. 253-260
Citations number
76
Categorie Soggetti
Physics
Journal title
Annales de physique → ACNP
ISSN journal
00034169
Volume
22
Year of publication
1997
Supplement
C1
Pages
253 - 260
Database
ISI
SICI code
0003-4169(1997)22:<253:TDBL-P>2.0.ZU;2-S