Jh. Wei et al., A POSSIBLE MECHANISM FOR IMPROVED LIGHT-INDUCED DEGRADATION IN DEUTERATED AMORPHOUS-SILICON ALLOY, Applied physics letters, 71(11), 1997, pp. 1498-1500
We have studied light-induced photoconductivity degradation in an intr
insic hydrogenated and deuterated amorphous-silicon (a-Si) alloy. Deut
erated a-Si turns out to be more stable under light exposure. A possib
le mechanism is proposed to explain this phenomenon. It is attributed
to the highly efficient coupling between the localized Si-D wagging mo
des (similar to 510 cm(-1)) and the extended Si-Si lattice vibration m
odes (similar to 495 cm(-1)). The energy released from electron or hol
e capture at silicon dangling bonds causes localized vibrations of nea
rby Si-D bonds. The energy dissipates quickly to the background lattic
e and a higher recombination rate at local sites is needed in deuterat
ed a-Si than in hydrogenated amorphous silicon to accumulate enough en
ergy to break the nearby weak bonds. (C) 1997 American Institute of Ph
ysics.