Dc. Kitchen et al., PHOTODISSOCIATION OF ACRYLIC-ACID AT 193 NM, The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 101(36), 1997, pp. 6603-6610
This paper describes the photolysis of acrylic acid (H2C=CHCOOH) monom
ers upon pi-->pi excitation at 193 nm. The photofragment velocity dis
tribution measurements indicate that only primary C-C and C-O bond fis
sions are major photodissociation pathways; molecular decarboxylation
and decarbonylation reactions do not occur to a significant extent. Th
ere are two different primary C-C bond fission channels resulting in t
he production of HOCO radicals in the ground and first electronically
excited states. We also determine an upper Limit on the C-C bond stren
gth of about 100 kcal/mol; this agrees with the value we calculate fro
m literature heats of formation but is considerably less than that ass
umed by previous workers.