W. Dummler et al., THE EFFECTS OF OXYGEN-CONTENT IN TI SI LAYER SYSTEMS ON MCS+ SIMS ANALYSIS/, International journal of mass spectrometry and ion processes, 164(1-2), 1997, pp. 155-159
Citations number
10
Categorie Soggetti
Spectroscopy,"Physics, Atomic, Molecular & Chemical
In secondary ion mass spectrometry (SIMS), profiling with a Cs+ primar
y beam and detection of the ejected species MCs+ are currently used in
quantitative analysis to minimize matrix effects. On the other hand,
the use of oxygen leakage in conventional SIMS analysis is also known
to be helpful in quantitative analysis as it also reduces the matrix e
ffects on the sputtering yields. Making use of the Cs+-SIMS technique,
depth profiling of Ti/Si layers with varying oxygen content shows tha
t mass interferences of the detected molecule CsSi+ with CsTi3O+ and C
sCO+ occur and lead to quantification errors. (C) 1997 Elsevier Scienc
e B.V.