Preferential etching of 6H and 4H SiC in molten KOH is studied at diff
erent temperatures as to the etching rate and defect appearance. The e
ffect of etching time on micropipe related etch-pit size is revealed.
Optimal etching conditions are suggested in order to gain information
on defect type and distribution. (C) 1997 Elsevier Science S.A.