LOW-FREQUENCY NOISE IN SILICON-CARBIDE SCHOTTKY DIODES

Citation
L. Anghel et al., LOW-FREQUENCY NOISE IN SILICON-CARBIDE SCHOTTKY DIODES, DIAMOND AND RELATED MATERIALS, 6(10), 1997, pp. 1494-1496
Citations number
6
Categorie Soggetti
Material Science
ISSN journal
09259635
Volume
6
Issue
10
Year of publication
1997
Pages
1494 - 1496
Database
ISI
SICI code
0925-9635(1997)6:10<1494:LNISSD>2.0.ZU;2-K
Abstract
The excess low frequency noise of silicon carbide Schottky diodes has been systematically measured on n-type SiC devices with Ti gates. The noise results have been related to general properties such as barrier height and doping level. The 1/f noise closely follows a model propose d in Ref. [3] [T.G.M. Kleinpenning, Solid State Electron. 22 (1979) 12 1-128] and is thus most probably due to mobility fluctuations in the d epletion region of the Schottky barrier. (C) 1997 Elsevier Science S.A .