TIME-DEPENDENT X-RAY PHOTOELECTRON-SPECTROSCOPY OBSERVED FOR DIMETHYLALUMINUM HYDRIDE ADSORBED ON SIO2

Time-dependent X-ray photoelectron spectroscopy (XPS) was observed for adsorbates of dimethylaluminum hydride formed on SiO2 surfaces. The p eak intensity of the C 1s spectra decreased slowly under 1847-eV Al K alpha X-ray irradiation; while the binding energy of the Al 2p spectra increased. The time dependence of the XPS spectra varied for the adso rbates formed over a range of temperatures from room temperature up to 200 degrees C. The time dependent XPS spectra was explained by the de composition of the adsorbates. However decomposition was not complete enough to produce Al or Al2O3 Indirect decomposition by secondary elec trons was suggested from X-ray induced electron emission measurements.