H. Koya et M. Hanabusa, TIME-DEPENDENT X-RAY PHOTOELECTRON-SPECTROSCOPY OBSERVED FOR DIMETHYLALUMINUM HYDRIDE ADSORBED ON SIO2, JPN J A P 1, 36(8), 1997, pp. 5233-5236
Time-dependent X-ray photoelectron spectroscopy (XPS) was observed for
adsorbates of dimethylaluminum hydride formed on SiO2 surfaces. The p
eak intensity of the C 1s spectra decreased slowly under 1847-eV Al K
alpha X-ray irradiation; while the binding energy of the Al 2p spectra
increased. The time dependence of the XPS spectra varied for the adso
rbates formed over a range of temperatures from room temperature up to
200 degrees C. The time dependent XPS spectra was explained by the de
composition of the adsorbates. However decomposition was not complete
enough to produce Al or Al2O3 Indirect decomposition by secondary elec
trons was suggested from X-ray induced electron emission measurements.