ORIGIN OF THE N-TYPE FIELD-EFFECT IN POLYANILINE AND OLIGOANILINE THIN-FILMS

Citation
J. Paloheimo et H. Stubb, ORIGIN OF THE N-TYPE FIELD-EFFECT IN POLYANILINE AND OLIGOANILINE THIN-FILMS, Synthetic metals, 89(1), 1997, pp. 51-55
Citations number
25
Categorie Soggetti
Physics, Condensed Matter","Material Science","Polymer Sciences
Journal title
ISSN journal
03796779
Volume
89
Issue
1
Year of publication
1997
Pages
51 - 55
Database
ISI
SICI code
0379-6779(1997)89:1<51:OOTNFI>2.0.ZU;2-D
Abstract
We analyse the n-type field effect recently reported for protonated, l ayer-by-layer self-assembled polyaniline and oligoaniline thin films. An agreement is obtained between the experiments and a model, valid fo r three-dimensional variable-range hopping in a parabolic Coulomb gap. The results suggest that the wave-function decay length xi and/or the dielectric constant epsilon vary with the position of the Fermi level (E-F), with a positive derivative d{ln[xi(E-F)epsilon(E-F)]}/dE(F) in the order of a few eV(-1). The apparent discrepancy between the p-typ e doping and n-type field effect is explained by the electron-hole asy mmetry characteristic for aniline derivatives.