ACCOUNT OF PHOTOELECTRON ELASTIC DETERMINATION OF OVERLAYER THICKNESS, IN-DEPTH PROFILING, ESCAPE DEPTH, ATTENUATION COEFFICIENTS AND INTENSITIES IN SURFACE SYSTEMS

Authors
NEFEDOV VI FEDOROVA IS
Citation
Vi. Nefedov et Is. Fedorova, ACCOUNT OF PHOTOELECTRON ELASTIC DETERMINATION OF OVERLAYER THICKNESS, IN-DEPTH PROFILING, ESCAPE DEPTH, ATTENUATION COEFFICIENTS AND INTENSITIES IN SURFACE SYSTEMS, Journal of electron spectroscopy and related phenomena, 85(3), 1997, pp. 221-248
Citations number
49
Categorie Soggetti
Spectroscopy
Journal title
Journal of electron spectroscopy and related phenomena → ACNP
ISSN journal
03682048
Volume
85
Issue
3
Year of publication
1997
Pages
221 - 248
Database
ISI
SICI code
0368-2048(1997)85:3<221:AOPEDO>2.0.ZU;2-0
Abstract
An analytical connection is found between parameters of Monte Carlo an d transport theory methods to account for elastic electron scattering in solids. A simple analytical method is proposed for the intensity ca lculations in X-ray photoelectron spectroscopy (XPS) and Auger electro n spectroscopy (AES) with account of elastic scattering. The method is applied for solution of many problems in XPS including determination of the overlayer thickness, correction factors for the in-depth profil ing, escape depth, attenuation lengths, intensities in layered systems . (C) 1997 Elsevier Science B.V.