PREPARATION OF ND2O3 THIN-FILMS BY A NOVEL SOL-GEL DIPPING PROCESS

A novel sol-gel dipping process is adopted to prepare Nd2O3 thin films with Nd(NO3)(3) . 6H(2)O asd precursor and collodion as viscosity-inc reasing agent. The annealing temperature of gel films is 600 degrees C and the thickness of Nd2O3 thin films increases linearly with the num ber of dippings at a rate of about 20 nm per dipping. This novel dip-c oating process provides a good reproducibility of tile homogeneous Nd2 O3 thin films. The function of collodion is discussed. Tile spectral a nd crystal properties of tile thin films are studied and the results i ndicate that the color of tile thin films mainly results from interfer ence.