MICROSCOPIC MAGNETIC CHARACTERIZATION OF SUBMICRON COBALT ISLANDS PREPARED USING SELF-ASSEMBLED POLYMER MASKING TECHNIQUE

Citation
S. Zhu et al., MICROSCOPIC MAGNETIC CHARACTERIZATION OF SUBMICRON COBALT ISLANDS PREPARED USING SELF-ASSEMBLED POLYMER MASKING TECHNIQUE, IEEE transactions on magnetics, 33(5), 1997, pp. 3022-3024
Citations number
8
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189464
Volume
33
Issue
5
Year of publication
1997
Part
1
Pages
3022 - 3024
Database
ISI
SICI code
0018-9464(1997)33:5<3022:MMCOSC>2.0.ZU;2-K
Abstract
Patterns of submicron cobalt islands were created on silicon by using self-assembled copolymers as etching masks. The synthesis conditions w ere varied to created specific magnetic island morphologies. The magne tic structure and magnetization reversal of interconnected, as well as interacting and non-interacting islands were systematically studied u sing magnetic force microscopy. Differences in magnetic characteristic s were observed and correlated with the thin film morphologies. The re sult of these studies include the transition from single to multidomai n configuration as a function of island size, domain boundary characte ristics near coercivity, evidence of magnetization rotation with incre asing reverse magnetic field, and evidence of collective switching beh avior in interacting single domain islands.