S. Zhu et al., MICROSCOPIC MAGNETIC CHARACTERIZATION OF SUBMICRON COBALT ISLANDS PREPARED USING SELF-ASSEMBLED POLYMER MASKING TECHNIQUE, IEEE transactions on magnetics, 33(5), 1997, pp. 3022-3024
Patterns of submicron cobalt islands were created on silicon by using
self-assembled copolymers as etching masks. The synthesis conditions w
ere varied to created specific magnetic island morphologies. The magne
tic structure and magnetization reversal of interconnected, as well as
interacting and non-interacting islands were systematically studied u
sing magnetic force microscopy. Differences in magnetic characteristic
s were observed and correlated with the thin film morphologies. The re
sult of these studies include the transition from single to multidomai
n configuration as a function of island size, domain boundary characte
ristics near coercivity, evidence of magnetization rotation with incre
asing reverse magnetic field, and evidence of collective switching beh
avior in interacting single domain islands.