PROCESS AND CHARACTERIZATION OF NITROGENATED CARBON

Authors
YANG MM CHAO JL RUSSAK MA
Citation
Mm. Yang et al., PROCESS AND CHARACTERIZATION OF NITROGENATED CARBON, IEEE transactions on magnetics, 33(5), 1997, pp. 3145-3147
Citations number
10
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
Journal title
IEEE transactions on magnetics → ACNP
ISSN journal
00189464
Volume
33
Issue
5
Year of publication
1997
Part
1
Pages
3145 - 3147
Database
ISI
SICI code
0018-9464(1997)33:5<3145:PACONC>2.0.ZU;2-B
Abstract
Nitrogenated carbon films prepared in a DC-magnetron sputtering system were studied. Properties, including deposition rate, nitrogen content , nano-hardness, and thin film stress, were investigated as a function of deposition conditions, i.e. sputter power, substrate bias, substra te temperature, and sputter pressure.