A new corrugated material comprising anti ferromagnetically coupled Co
/Cu multilayers was prepared using V-grooved Si substrates. Scanning e
lectron microscopy and x-ray diffraction observations indicate that th
e corrugated multilayers were successfully grown with the formation of
smooth and clear interfaces, Magnetoresistance change with the sense
current normal to the grooves was larger than that with the current pa
rallel to the grooves. The MR enhancement due to the difference in mea
surement geometry increased as the width of the grooves decreased.