MAGNETIC-ANISOTROPY OF SPUTTERED FEN FILMS DUE TO ANISOTROPIC COLUMNAR GROWTH OF GRAINS

FeN thin films were deposited by RF reactive diode sputtering to inves tigate magnetic anisotropy variation due to substrate tilt up to 54 de grees during the film deposition. Their magnetic and morphological pro perties were measured by vibrating sample magnetometer (VSM), scanning electron microscope (SEM) and atomic force microscope (AFM). As the s ubstrate tilt angle was increased, an anisotropy in the direction para llel to the substrate tilt pivot edge was induced. SEM micrographs sho w columnar growth of grains enlongated along the substrate tilt pivot edges. The magnitude of the anisotropy was estimated by assuming the f ilm surface roughness (''hills'') are oblate ellipsoids. The shape ani sotropy thus was estimated at 26 Oe at 45 degrees substrate tilt, whic h corresponded reasonably well with the measured anisotropy change of 30 Oe.