Hs. Oh et al., EFFECT OF SPUTTERING PRESSURE OF PD UNDERLAYER ON THE PERPENDICULAR MAGNETIC-ANISOTROPY IN CO PD MULTILAYERED THIN-FILMS/, IEEE transactions on magnetics, 33(5), 1997, pp. 3655-3657
The magnetic properties of Co/Pd multilayers, in particular the perpen
dicular magnetic anisotropy, have been analyzed as a function of the s
puttering pressure of Pd underlayer, With an increase of sputtering pr
essure of the underlayer from 6 mTorr to 25 mTorr, perpendicular coerc
ivity of the multilayers increased with a slight decrease of saturatio
n magnetization, and the increment of the coercivity was larger for th
e films with thinner cobalt layers, From the anisotropy analysis, it w
as found that the interface anisotropy energy decreased from 0.390 erg
/cm(2) to 0.255 erg/cm(2) because of the interface roughening of the m
ultilayers, which was mainly responsible for the decrease of perpendic
ular anisotropy, while the volume anisotropy energy increased from -11
.37x10(6) erg/cm(3) to -7.90x10(6) erg/cm(3). The abnormally large int
rinsic volume anisotropy energies of the multilayers with thin cobalt
layers(<7 Angstrom) appears to suggest the noticeable contribution of
magnetoelastic effect to the perpendicular anisotropy of the films.