EFFECT OF SPUTTERING PRESSURE OF PD UNDERLAYER ON THE PERPENDICULAR MAGNETIC-ANISOTROPY IN CO PD MULTILAYERED THIN-FILMS/

Authors
Citation
Hs. Oh et al., EFFECT OF SPUTTERING PRESSURE OF PD UNDERLAYER ON THE PERPENDICULAR MAGNETIC-ANISOTROPY IN CO PD MULTILAYERED THIN-FILMS/, IEEE transactions on magnetics, 33(5), 1997, pp. 3655-3657
Citations number
11
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189464
Volume
33
Issue
5
Year of publication
1997
Part
2
Pages
3655 - 3657
Database
ISI
SICI code
0018-9464(1997)33:5<3655:EOSPOP>2.0.ZU;2-O
Abstract
The magnetic properties of Co/Pd multilayers, in particular the perpen dicular magnetic anisotropy, have been analyzed as a function of the s puttering pressure of Pd underlayer, With an increase of sputtering pr essure of the underlayer from 6 mTorr to 25 mTorr, perpendicular coerc ivity of the multilayers increased with a slight decrease of saturatio n magnetization, and the increment of the coercivity was larger for th e films with thinner cobalt layers, From the anisotropy analysis, it w as found that the interface anisotropy energy decreased from 0.390 erg /cm(2) to 0.255 erg/cm(2) because of the interface roughening of the m ultilayers, which was mainly responsible for the decrease of perpendic ular anisotropy, while the volume anisotropy energy increased from -11 .37x10(6) erg/cm(3) to -7.90x10(6) erg/cm(3). The abnormally large int rinsic volume anisotropy energies of the multilayers with thin cobalt layers(<7 Angstrom) appears to suggest the noticeable contribution of magnetoelastic effect to the perpendicular anisotropy of the films.