THE CHEMISTRY OF ETCHING AND DEPOSITION PROCESSES

Authors
DAGOSTINO R FRACASSI F LAMENDOLA R
Citation
R. Dagostino et al., THE CHEMISTRY OF ETCHING AND DEPOSITION PROCESSES, Pure and applied chemistry, 66(6), 1994, pp. 1185-1193
Citations number
24
Categorie Soggetti
Chemistry
Journal title
Pure and applied chemistry → ACNP
ISSN journal
00334545
Volume
66
Issue
6
Year of publication
1994
Pages
1185 - 1193
Database
ISI
SICI code
0033-4545(1994)66:6<1185:TCOEAD>2.0.ZU;2-B
Abstract
XPS surface analysis, particularly with an in situ approach, coupled w ith plasma diagnostic techniques, gives a fairly good insight of plasm a-surface interactions. Specific examples to be discussed include etch ing of Al, Ti, TiN, W, and deposition of thin films from organosilicon precursors.