A tri-arc Czochralski crystal growth system, for preparing high-purity
crystals of metallic materials, is described. To improve the environm
ental cleanliness within the chamber beyond that found in conventional
tri-are systems, the equipment is built to ultra-high-vacuum standard
s (although actual operation in Vacuum is not possible) so that leaks
into the system and degassing of contaminating gases from the chamber
walls during growth are minimized. Crystal growths of the intermetalli
c compounds TiAl and HoCo2 are illustrated. (C) 1997 American Institut
e of Physics.