Citation: J. Haidar, A THEORETICAL-MODEL FOR GAS METAL ARC-WELDING AND GAS TUNGSTEN ARC-WELDING, Journal of applied physics, 84(7), 1998, pp. 3518-3529
Citation: Jp. Boeuf et L. Garrigues, LOW-FREQUENCY OSCILLATIONS IN A STATIONARY PLASMA THRUSTER, Journal of applied physics, 84(7), 1998, pp. 3541-3554
Citation: Me. Law et al., EFFECT OF THE SILICON OXIDE INTERFACE ON INTERSTITIALS - DI-INTERSTITIAL RECOMBINATION/, Journal of applied physics, 84(7), 1998, pp. 3555-3560
Authors:
GOTZ W
PENSL G
ZULEHNER W
NEWMAN RC
MCQUAID SA
Citation: W. Gotz et al., THERMAL DONOR FORMATION AND ANNIHILATION AT TEMPERATURES ABOVE 500-DEGREES-C IN CZOCHRALSKI-GROWN SI, Journal of applied physics, 84(7), 1998, pp. 3561-3568
Citation: Ca. Londos et al., INFRARED STUDIES OF DEFECTS FORMED DURING POSTIRRADIATION ANNEALS OF CZOCHRALSKI SILICON, Journal of applied physics, 84(7), 1998, pp. 3569-3573
Citation: S. Tamura et Y. Horie, DISCRETE MESO-DYNAMIC SIMULATION OF THERMAL-EXPLOSION IN SHEAR BANDS, Journal of applied physics, 84(7), 1998, pp. 3574-3580
Citation: D. Shaw et Tl. Shaw, A LEAST-SQUARES METHOD FOR FITTING DIFFUSION DATA TO THE WHIPPLE SUZUOKA EQUATIONS FOR GRAIN-BOUNDARY DIFFUSION/, Journal of applied physics, 84(7), 1998, pp. 3586-3592
Citation: Pm. Rousseau et al., ARSENIC DEACTIVATION ENHANCED DIFFUSION - A TIME, TEMPERATURE, AND CONCENTRATION STUDY, Journal of applied physics, 84(7), 1998, pp. 3593-3601
Citation: Gl. Bennis et al., THERMAL-DIFFUSIVITY MEASUREMENT OF SOLID MATERIALS BY THE PULSED PHOTOTHERMAL DISPLACEMENT TECHNIQUE, Journal of applied physics, 84(7), 1998, pp. 3602-3610
Authors:
SNOEKS E
MARSHALL T
PETRUZZELLO J
PASHLEY MD
CHAO LL
CARGILL GS
Citation: E. Snoeks et al., DIFFUSION LENGTHS OF CARRIERS IN N-TYPE AND P-TYPE ZNMGSSE CLADDING LAYERS OF GREEN LASER-DIODES, Journal of applied physics, 84(7), 1998, pp. 3611-3616
Citation: Ku. Harder et al., STRUCTURE, MAGNETIC, AND MAGNETOOPTICAL PROPERTIES OF MNBI FILMS GROWN ON QUARTZ AND (001) GAAS SUBSTRATES, Journal of applied physics, 84(7), 1998, pp. 3625-3629
Citation: Gh. Shen et al., THE GROWTH OF PINHOLE-FREE EPITAXIAL DYSI2-X FILMS ON ATOMICALLY CLEAN SI(111), Journal of applied physics, 84(7), 1998, pp. 3630-3635
Authors:
BARRIERE AS
CESAIRE T
HIRSCH L
PORTE B
VILLENUEVE G
LEZAMA L
ROJO T
BARBERIS GE
Citation: As. Barriere et al., ENVIRONMENT OF ER IN EPITAXIAL CA1-XERXF2-FILMS USING LOCAL TECHNIQUES(X THIN), Journal of applied physics, 84(7), 1998, pp. 3654-3657
Citation: S. Ichikawa et al., SURFACE-STRUCTURES AND ELECTRONIC STATES OF CLEAN AND (NH4)(2)S-X -TREATED, INAS(111)A AND (111)B, Journal of applied physics, 84(7), 1998, pp. 3658-3663
Citation: A. Schenk, FINITE-TEMPERATURE FULL RANDOM-PHASE-APPROXIMATION MODEL OF BAND-GAP NARROWING FOR SILICON DEVICE SIMULATION, Journal of applied physics, 84(7), 1998, pp. 3684-3695
Citation: Kj. Kim et al., OPTICAL-CONSTANTS AND ELECTRONIC INTERBAND-TRANSITIONS OF DISORDERED GAAS1-XPX ALLOYS, Journal of applied physics, 84(7), 1998, pp. 3696-3699
Authors:
BUENO PR
PIANARO SA
PEREIRA EC
BULHOES LOS
LONGO E
VARELA JA
Citation: Pr. Bueno et al., INVESTIGATION OF THE ELECTRICAL-PROPERTIES OF SNO2 VARISTOR SYSTEM USING IMPEDANCE SPECTROSCOPY, Journal of applied physics, 84(7), 1998, pp. 3700-3705