Authors: KIRMSE KHR WENDT AE DISCH SB WU JZ ABRAHAM IC MEYER JA BREUN RA WOODS RC

Citation: Khr. Kirmse et al., SIO2 TO SI SELECTIVITY MECHANISMS IN HIGH-DENSITY FLUOROCARBON PLASMA-ETCHING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(2), 1996, pp. 710-715