Authors: PATSIS G RAPTIS I GLEZOS N ARGITIS P HATZAKIS M AIDINIS CJ GENTILI M MAGGIORA R

Citation: G. Patsis et al., GEL FORMATION THEORY APPROACH FOR THE MODELING OF NEGATIVE CHEMICALLYAMPLIFIED E-BEAM RESISTS, Microelectronic engineering, 35(1-4), 1997, pp. 157-160

Authors: EVERETT JP SCHMIDT DL ROSE GD ARGRITIS P AIDINIS CJ HATZAKIS M

Citation: Jp. Everett et al., SYNTHESIS OF SOME ONIUM SALTS AND THEIR COMPARISON AS CATIONIC PHOTOINITIATORS IN AN EPOXY RESIST, Polymer, 38(7), 1997, pp. 1719-1723

Authors: ARGITIS P RAPTIS I AIDINIS CJ GLEZOS N BACIOCCHI M EVERETT J HATZAKIS M

Citation: P. Argitis et al., ADVANCED EPOXY NOVOLAC RESIST FOR FAST HIGH-RESOLUTION ELECTRON-BEAM LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3030-3034