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Authors: ALEXANDROV P KOPRINAROVA J TODOROV D

Citation: P. Alexandrov et al., INFLUENCE OF THE DEPOSITION PARAMETERS ON THE CHEMICAL-COMPOSITION OFREACTIVELY RF-SPUTTERED TIO2 ON SI, Applied surface science, 115(2), 1997, pp. 128-134

Authors: ALEXANDROV P KOPRINAROVA J TODOROV D

Citation: P. Alexandrov et al., DIELECTRIC-PROPERTIES OF TIO2-FILMS REACTIVELY SPUTTERED FROM TI IN AN RF MAGNETRON, Vacuum, 47(11), 1996, pp. 1333-1336