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Authors: ANDERS S ANDERS A
Citation: S. Anders et A. Anders, 17TH INTERNATIONAL-SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM, BERKELEY, CALIFORNIA, IEEE electrical insulation magazine, 12(6), 1996, pp. 27-28

Authors: ANDERS S ANDERS A BROWN I KONG F MCLARNON F
Citation: S. Anders et al., SURFACE MODIFICATION OF NICKEL BATTERY ELECTRODES BY COBALT PLASMA IMMERSION ION-IMPLANTATION AND DEPOSITION, Surface & coatings technology, 85(1-2), 1996, pp. 75-79

Authors: BROWN IG ANDERS A ANDERS S DICKINSON MR MACGILL RA OKS EM
Citation: Ig. Brown et al., RECENT ADVANCES IN VACUUM ARE ION SOURCES, Surface & coatings technology, 84(1-3), 1996, pp. 550-556

Authors: MACGILL RA ANDERS S ANDERS A CASTRO RA DICKINSON MR YU KM BROWN IG
Citation: Ra. Macgill et al., CATHODIC ARC DEPOSITION OF COPPER-OXIDE THIN-FILMS, Surface & coatings technology, 78(1-3), 1996, pp. 168-172

Authors: UEBEL U KUBITZ J ANDERS A
Citation: U. Uebel et al., LASER-INDUCED FLUORESCENCE SPECTROSCOPY OF PHYTOPLANKTON AND CHEMICALS WITH REGARD TO AN IN-SITU DETECTION IN WATERS, Journal of plant physiology, 148(5), 1996, pp. 586-592

Authors: OKS EM ANDERS A BROWN IG DICKINSON MR MACGILL RA
Citation: Em. Oks et al., ION CHARGE-STATE DISTRIBUTIONS IN HIGH-CURRENT VACUUM-ARC PLASMAS IN A MAGNETIC-FIELD, IEEE transactions on plasma science, 24(3), 1996, pp. 1174-1183

Authors: ANDERS A ANDERS S JUTTNER B LUCK H
Citation: A. Anders et al., HIGH-RESOLUTION IMAGING OF VACUUM-ARC CATHODE SPOTS, IEEE transactions on plasma science, 24(1), 1996, pp. 69-70

Authors: ANDERS A NEWMAN N RUBIN M DICKINSON M JONES E PHATAK P GASSMANN A
Citation: A. Anders et al., HOLLOW-ANODE PLASMA SOURCE FOR MOLECULAR-BEAM EPITAXY OF GALLIUM NITRIDE, Review of scientific instruments, 67(3), 1996, pp. 905-907

Authors: BROWN IG ANDERS A ANDERS S DICKINSON MR MACGILL RA
Citation: Ig. Brown et al., PERISTALTIC ION-SOURCE, Review of scientific instruments, 67(3), 1996, pp. 956-958

Authors: ANDERS A BROWN I MACGILL R DICKINSON M
Citation: A. Anders et al., HIGH ION CHARGE STATES IN A HIGH-CURRENT, SHORT-PULSE, VACUUM-ARC ION-SOURCE, Review of scientific instruments, 67(3), 1996, pp. 1202-1204

Authors: FENG Z KOMVOPOULOS K BOGY DB AGER JW ANDERS S ANDERS A WANG Z BROWN IG
Citation: Z. Feng et al., EFFECT OF PRETREATMENT PROCESS PARAMETERS ON DIAMOND NUCLEATION ON UNSCRATCHED SILICON SUBSTRATES COATED WITH AMORPHOUS-CARBON FILMS, Journal of applied physics, 79(1), 1996, pp. 485-492

Authors: ANDERS A BONDARENKO V FEHER A ORENDACHEVA A
Citation: A. Anders et al., CSDY(MOO4)(2) AS A LOW-TEMPERATURE DIPOLE MAGNET, Czechoslovak journal of Physics, 46, 1996, pp. 2093-2094

Authors: PHARR GM CALLAHAN DL MCADAMS SD TSUI TY ANDERS S ANDERS A AGER JW BROWN IG BHATIA CS SILVA SRP ROBERTSON J
Citation: Gm. Pharr et al., HARDNESS, ELASTIC-MODULUS, AND STRUCTURE OF VERY HARD CARBON-FILMS PRODUCED BY CATHODIC-ARC DEPOSITION WITH SUBSTRATE PULSE BIASING, Applied physics letters, 68(6), 1996, pp. 779-781

Authors: CHAE MS MAPLE MB SIMNAD MT ANDERS S ANDERS A BROWN IG
Citation: Ms. Chae et al., PREPARATION OF CATHODIC ARC DEPOSITED HTSC BI2SR2CACU2O8-AG COMPOSITETHIN-FILMS ON AG SUBSTRATES(Y), IEEE transactions on applied superconductivity, 5(2), 1995, pp. 2011-2014

Authors: ANDERS A ANDERS S
Citation: A. Anders et S. Anders, THE WORKING PRINCIPLE OF THE HOLLOW-ANODE PLASMA SOURCE, Plasma sources science & technology, 4(4), 1995, pp. 571-575

Authors: ANDERS A ANDERS S BROWN IG
Citation: A. Anders et al., TRANSPORT OF VACUUM-ARC PLASMAS THROUGH MAGNETIC MACROPARTICLE FILTERS, Plasma sources science & technology, 4(1), 1995, pp. 1-12

Authors: ANDERS S ANDERS A RUBIN M WANG Z RAOUX S KONG F BROWN IG
Citation: S. Anders et al., FORMATION OF METAL-OXIDES BY CATHODIC ARC DEPOSITION, Surface & coatings technology, 76(1-3), 1995, pp. 167-173

Authors: BROWN IG ANDERS A ANDERS S CASTRO RA DICKINSON MR MACGILL RA WANG Z
Citation: Ig. Brown et al., SYNTHESIS OF UNATTAINABLE ION-IMPLANTATION PROFILES - PSEUDO-IMPLANTATION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 106(1-4), 1995, pp. 646-650

Authors: ANDERS A ANDERS S BROWN IG YU KM
Citation: A. Anders et al., INCREASING THE RETAINED DOSE BY PLASMA IMMERSION ION-IMPLANTATION ANDDEPOSITION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 102(1-4), 1995, pp. 132-135

Authors: ANDERS A ANDERS S GUNDERSEN MA MARTSINOVSKII AM
Citation: A. Anders et al., SELF-SUSTAINED SELF-SPUTTERING - A POSSIBLE MECHANISM FOR THE SUPERDENSE GLOW PHASE OF A PSEUDOSPARK, IEEE transactions on plasma science, 23(3), 1995, pp. 275-282

Authors: ANDERS A ALTHEIDE HJ KNALMANN M TRONNIER H
Citation: A. Anders et al., ACTION SPECTRUM FOR ERYTHEMA IN HUMANS INVESTIGATED WITH DYE-LASERS, Photochemistry and photobiology, 61(2), 1995, pp. 200-205

Authors: BHUSHAN B GUPTA BK SUNDARAM R DEY S ANDERS S ANDERS A BROWN IG READER PD
Citation: B. Bhushan et al., DEVELOPMENT OF HARD CARBON COATINGS FOR THIN-FILM TAPE HEADS, IEEE transactions on magnetics, 31(6), 1995, pp. 2976-2978

Authors: AGER JW ANDERS S ANDERS A BROWN IG
Citation: Jw. Ager et al., EFFECT OF INTRINSIC GROWTH STRESS ON THE RAMAN-SPECTRA OF VACUUM-ARC-DEPOSITED AMORPHOUS-CARBON FILMS, Applied physics letters, 66(25), 1995, pp. 3444-3446

Authors: ANDERS A ANDERS S BROWN IG DICKINSON MR MACGILL RA
Citation: A. Anders et al., METAL PLASMA IMMERSION ION-IMPLANTATION AND DEPOSITION USING VACUUM-ARC PLASMA SOURCES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(2), 1994, pp. 815-820

Authors: BROWN IG ANDERS A ANDERS S DICKINSON MR MACGILL RA
Citation: Ig. Brown et al., METAL-ION IMPLANTATION - CONVENTIONAL VERSUS IMMERSION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(2), 1994, pp. 823-827
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