Citation: S. Anders et A. Anders, 17TH INTERNATIONAL-SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM, BERKELEY, CALIFORNIA, IEEE electrical insulation magazine, 12(6), 1996, pp. 27-28
Authors:
ANDERS S
ANDERS A
BROWN I
KONG F
MCLARNON F
Citation: S. Anders et al., SURFACE MODIFICATION OF NICKEL BATTERY ELECTRODES BY COBALT PLASMA IMMERSION ION-IMPLANTATION AND DEPOSITION, Surface & coatings technology, 85(1-2), 1996, pp. 75-79
Citation: U. Uebel et al., LASER-INDUCED FLUORESCENCE SPECTROSCOPY OF PHYTOPLANKTON AND CHEMICALS WITH REGARD TO AN IN-SITU DETECTION IN WATERS, Journal of plant physiology, 148(5), 1996, pp. 586-592
Authors:
OKS EM
ANDERS A
BROWN IG
DICKINSON MR
MACGILL RA
Citation: Em. Oks et al., ION CHARGE-STATE DISTRIBUTIONS IN HIGH-CURRENT VACUUM-ARC PLASMAS IN A MAGNETIC-FIELD, IEEE transactions on plasma science, 24(3), 1996, pp. 1174-1183
Authors:
ANDERS A
NEWMAN N
RUBIN M
DICKINSON M
JONES E
PHATAK P
GASSMANN A
Citation: A. Anders et al., HOLLOW-ANODE PLASMA SOURCE FOR MOLECULAR-BEAM EPITAXY OF GALLIUM NITRIDE, Review of scientific instruments, 67(3), 1996, pp. 905-907
Citation: A. Anders et al., HIGH ION CHARGE STATES IN A HIGH-CURRENT, SHORT-PULSE, VACUUM-ARC ION-SOURCE, Review of scientific instruments, 67(3), 1996, pp. 1202-1204
Authors:
FENG Z
KOMVOPOULOS K
BOGY DB
AGER JW
ANDERS S
ANDERS A
WANG Z
BROWN IG
Citation: Z. Feng et al., EFFECT OF PRETREATMENT PROCESS PARAMETERS ON DIAMOND NUCLEATION ON UNSCRATCHED SILICON SUBSTRATES COATED WITH AMORPHOUS-CARBON FILMS, Journal of applied physics, 79(1), 1996, pp. 485-492
Authors:
PHARR GM
CALLAHAN DL
MCADAMS SD
TSUI TY
ANDERS S
ANDERS A
AGER JW
BROWN IG
BHATIA CS
SILVA SRP
ROBERTSON J
Citation: Gm. Pharr et al., HARDNESS, ELASTIC-MODULUS, AND STRUCTURE OF VERY HARD CARBON-FILMS PRODUCED BY CATHODIC-ARC DEPOSITION WITH SUBSTRATE PULSE BIASING, Applied physics letters, 68(6), 1996, pp. 779-781
Authors:
CHAE MS
MAPLE MB
SIMNAD MT
ANDERS S
ANDERS A
BROWN IG
Citation: Ms. Chae et al., PREPARATION OF CATHODIC ARC DEPOSITED HTSC BI2SR2CACU2O8-AG COMPOSITETHIN-FILMS ON AG SUBSTRATES(Y), IEEE transactions on applied superconductivity, 5(2), 1995, pp. 2011-2014
Citation: A. Anders et S. Anders, THE WORKING PRINCIPLE OF THE HOLLOW-ANODE PLASMA SOURCE, Plasma sources science & technology, 4(4), 1995, pp. 571-575
Citation: A. Anders et al., TRANSPORT OF VACUUM-ARC PLASMAS THROUGH MAGNETIC MACROPARTICLE FILTERS, Plasma sources science & technology, 4(1), 1995, pp. 1-12
Authors:
BROWN IG
ANDERS A
ANDERS S
CASTRO RA
DICKINSON MR
MACGILL RA
WANG Z
Citation: Ig. Brown et al., SYNTHESIS OF UNATTAINABLE ION-IMPLANTATION PROFILES - PSEUDO-IMPLANTATION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 106(1-4), 1995, pp. 646-650
Citation: A. Anders et al., INCREASING THE RETAINED DOSE BY PLASMA IMMERSION ION-IMPLANTATION ANDDEPOSITION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 102(1-4), 1995, pp. 132-135
Authors:
ANDERS A
ANDERS S
GUNDERSEN MA
MARTSINOVSKII AM
Citation: A. Anders et al., SELF-SUSTAINED SELF-SPUTTERING - A POSSIBLE MECHANISM FOR THE SUPERDENSE GLOW PHASE OF A PSEUDOSPARK, IEEE transactions on plasma science, 23(3), 1995, pp. 275-282
Authors:
ANDERS A
ALTHEIDE HJ
KNALMANN M
TRONNIER H
Citation: A. Anders et al., ACTION SPECTRUM FOR ERYTHEMA IN HUMANS INVESTIGATED WITH DYE-LASERS, Photochemistry and photobiology, 61(2), 1995, pp. 200-205
Citation: Jw. Ager et al., EFFECT OF INTRINSIC GROWTH STRESS ON THE RAMAN-SPECTRA OF VACUUM-ARC-DEPOSITED AMORPHOUS-CARBON FILMS, Applied physics letters, 66(25), 1995, pp. 3444-3446
Authors:
ANDERS A
ANDERS S
BROWN IG
DICKINSON MR
MACGILL RA
Citation: A. Anders et al., METAL PLASMA IMMERSION ION-IMPLANTATION AND DEPOSITION USING VACUUM-ARC PLASMA SOURCES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(2), 1994, pp. 815-820
Authors:
BROWN IG
ANDERS A
ANDERS S
DICKINSON MR
MACGILL RA
Citation: Ig. Brown et al., METAL-ION IMPLANTATION - CONVENTIONAL VERSUS IMMERSION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(2), 1994, pp. 823-827