Authors:
HUANG CL
SOLEIMANI H
GRULA G
ARORA ND
ANTONIADIS D
Citation: Cl. Huang et al., ISOLATION PROCESS DEPENDENCE OF CHANNEL MOBILITY IN THIN-FILM SOI DEVICES, IEEE electron device letters, 17(6), 1996, pp. 291-293
Citation: Jb. Jacobs et D. Antoniadis, CHANNEL PROFILE ENGINEERING FOR MOSFETS WITH 100-NM CHANNEL LENGTHS, I.E.E.E. transactions on electron devices, 42(5), 1995, pp. 870-875