Citation: Lj. Arias et al., CHARACTERIZATION OF A LOW-TEMPERATURE, LOW-PRESSURE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION TETRAETHYLORTHOSILICATE OXIDE DEPOSITION PROCESS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 1389-1393
Citation: Mt. Weise et al., CHARACTERIZATION OF FLUORINATED TETRA ETHYL ORTHO SILICATE OXIDE-FILMS DEPOSITED IN A LOW-PRESSURE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION REACTOR, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 1399-1402
Authors:
OKADA Y
TOBIN PJ
LAKHOTIA V
AJURIA SA
HEGDE RI
LIAO JC
RUSHBROOK PP
ARIAS LJ
Citation: Y. Okada et al., EVALUATION OF INTERFACIAL NITROGEN CONCENTRATION OF RTP OXYNITRIDES BY REOXIDATION, Journal of the Electrochemical Society, 140(6), 1993, pp. 87-89