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SUH S
HOFFMAN DM
ATAGI LM
SMITH DC
LIU JR
CHU WK
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Authors:
ATAGI LM
HOFFMAN DM
LIU JR
ZHENG ZS
CHU WK
RUBIANO RR
SPRINGER RW
SMITH DC
Citation: Lm. Atagi et al., HOMOLEPTIC TIN AND SILICON AMIDO COMPOUNDS AS PRECURSORS FOR LOW-TEMPERATURE ATMOSPHERIC-PRESSURE CHEMICAL-VAPOR-DEPOSITION OF TIN AND SILICON-OXIDE THIN-FILMS, Chemistry of materials, 6(4), 1994, pp. 360-361
Citation: Lm. Atagi et Jm. Mayer, REACTIONS OF THE TUNGSTEN CARBYNE COMPLEX W(CME)CL(PME(3))(4) WITH PI-ACCEPTOR LIGANDS - CARBON-MONOXIDE, ALKYNES, AND ALKENES, Organometallics, 13(12), 1994, pp. 4794-4803
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