Authors:
Aguas, H
Marques, A
Martins, R
Fortunato, E
Citation: H. Aguas et al., Fast and cheap method to qualitatively measure the thickness and uniformity of ZrO2 thin films, MAT SC S PR, 4(1-3), 2001, pp. 319-321
Authors:
Martins, R
Aguas, H
Ferreira, I
Silva, V
Cabrita, A
Fortunato, E
Citation: R. Martins et al., Role of ion bombardment and plasma impedance on the performances presentedby undoped a-Si : H films, THIN SOL FI, 383(1-2), 2001, pp. 165-168
Authors:
Aguas, H
Nunes, Y
Fortunato, E
Gordo, P
Maneira, M
Martins, R
Citation: H. Aguas et al., Correlation between a-Si : H surface oxidation process and the performanceof MIS structures, THIN SOL FI, 383(1-2), 2001, pp. 185-188
Authors:
Fortunato, E
Brida, D
Ferreira, I
Aguas, H
Nunes, P
Martins, R
Citation: E. Fortunato et al., Production and characterization of large area flexible thin film position sensitive detectors, THIN SOL FI, 383(1-2), 2001, pp. 310-313
Authors:
Aguas, H
Silva, V
Ferreira, I
Fortunato, E
Martins, R
Citation: H. Aguas et al., Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films, PHIL MAG B, 80(4), 2000, pp. 475-486
Authors:
Martins, R
Aguas, H
Cabrita, A
Tonello, P
Silva, V
Ferreira, I
Fortunato, E
Guimaraes, L
Citation: R. Martins et al., New nanostructured silicon films grown by PECVD technique under controlledpowder formation conditions, SOLAR ENERG, 69(1-6), 2000, pp. 263-269
Authors:
Ferreira, I
Aguas, H
Mendes, L
Martins, R
Citation: I. Ferreira et al., Role of the hot wire filament temperature on the structure and morphology of the nanocrystalline silicon p-doped films, APPL SURF S, 145, 1999, pp. 690-696
Authors:
Fortunato, E
Soares, F
Teodoro, P
Guimaraes, N
Mendes, M
Aguas, H
Silva, V
Martins, R
Citation: E. Fortunato et al., Characteristics of a linear array of a-Si : H thin film position sensitivedetector, THIN SOL FI, 337(1-2), 1999, pp. 222-225