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Results: 1-14 |
Results: 14

Authors: Rusli,"Yoon, SF Huang, QF Ahn, J Zhang, Q Yang, H Wu, YS Teo, EJ Osipowicz, T Watt, F
Citation: Sf. Rusli,"yoon et al., Metal-containing amorphous carbon film development using electron cyclotron resonance CVD, DIAM RELAT, 10(2), 2001, pp. 132-138

Authors: Zhang, Q Yoon, SF Ahn, J",Rusli,"Yang, H Gan, B Yang, CY Watt, F Teo, EJ Osipowice, T
Citation: Q. Zhang et al., Structural modification of polymeric amorphous hydrogenated carbon films induced by high energetic He+ irradiation and thermal annealing, DIAM RELAT, 9(9-10), 2000, pp. 1758-1761

Authors: Huang, QF Yoon, SF",Rusli,"Yang, H Ahn, J Zhang, Q
Citation: Qf. Huang et al., Molybdenum-containing carbon films deposited using the screen grid technique in an electron cyclotron resonance chemical vapor deposition system, DIAM RELAT, 9(3-6), 2000, pp. 534-538

Authors: Gan, B Ahn, J Zhang, Q Yoon, SF",Rusli,"Huang, QF Yang, H Yu, MB Li, WZ
Citation: B. Gan et al., Branching carbon nanotubes deposited in HFCVD system, DIAM RELAT, 9(3-6), 2000, pp. 897-900

Authors: Rusli,"Yoon, SF Yang, H Ahn, J Huang, QF Zhang, Q Guo, YP Yang, CY Yeo, EJ Wee, ATS Huan, ACH Watt, F
Citation: Sf. Rusli,"yoon et al., Tungsten-carbon thin films deposited using screen grid technique in an electron cyclotron resonance chemical vapour deposition system, SURF COAT, 123(2-3), 2000, pp. 134-139

Authors: Yoon, SF Huang, QF",Rusli,"Yang, H Ahn, J Zhang, Q Shi, X
Citation: Sf. Yoon et al., Characteristics of molybdenum-containing a-C : H films deposited using electron cyclotron resonance CVD, INT J MOD B, 14(2-3), 2000, pp. 309-314

Authors: Huang, QF Yoon, SF",Rusli,"Yang, H Gan, B Chew, K Ahn, J
Citation: Qf. Huang et al., Conduction mechanism in molybdenum-containing diamond-like carbon deposited using electron cyclotron resonance chemical vapor deposition, J APPL PHYS, 88(7), 2000, pp. 4191-4195

Authors: Rusli,"Yoon, SF Huang, QF Yang, H Yu, MB Ahn, J Zhang, Q Teo, EJ Osipowicz, T Watt, F
Citation: Sf. Rusli,"yoon et al., Investigation of molybdenum-carbon films (Mo-C : H) deposited using an electron cyclotron resonance chemical vapor deposition system, J APPL PHYS, 88(6), 2000, pp. 3699-3704

Authors: Rusli,"Yoon, SF Wu, YS Yang, H Ahn, J Zhang, Q
Citation: Sf. Rusli,"yoon et al., Control of ion energy using a screen-grid in an electron cyclotron resonance chemical vapour deposition system, DIAM RELAT, 8(2-5), 1999, pp. 477-480

Authors: Rusli,"Yoon, SF Yang, H Ahn, J Huang, QF Zhang, Q Guo, YP Yang, CY Teo, EJ Wee, ATS Huan, ACH
Citation: Sf. Rusli,"yoon et al., Investigation of tungsten incorporated amorphous carbon film, THIN SOL FI, 356, 1999, pp. 174-178

Authors: Zhang, Q Yoon, SF Ahn, J",Rusli,"Yang, H Yang, C Watt, F Teo, EJ Osipowice, T
Citation: Q. Zhang et al., Effects of high energetic He+ ion irradiation on the structure of polymeric hydrogenated amorphous carbon, MICROELEC J, 30(8), 1999, pp. 801-805

Authors: Yoon, SF Huang, QF",Rusli,"Yang, H Ahn, J Zhang, Q Blomfield, C Tielsch, B Tan, LYC
Citation: Sf. Yoon et al., X-ray photoelectron spectroscopy of molybdenum-containing carbon films, J APPL PHYS, 86(9), 1999, pp. 4871-4875

Authors: Zhang, Q Yoon, SF",Rusli,"Ahn, J Yang, H Bahr, D
Citation: Q. Zhang et al., Study of hydrogenated diamond-like carbon films using x-ray reflectivity, J APPL PHYS, 86(1), 1999, pp. 289-296

Authors: Rusli,"Yoon, SF Yang, H Ahn, J Zhang, Q Wu, YS New, WL
Citation: Sf. Rusli,"yoon et al., Influence of process pressure on the growth of hydrocarbon films under direct dc bias in an electron cyclotron resonance plasma, J APPL PHYS, 84(9), 1998, pp. 5277-5282
Risultati: 1-14 |