Authors:
Mukherjee, C
Anandan, C
Seth, T
Dixit, PN
Bhattacharyya, R
Citation: C. Mukherjee et al., Properties of a-Si : H films deposited from silane diluted with hydrogen and helium using modified pulse plasma technique, J VAC SCI A, 17(6), 1999, pp. 3202-3208
Citation: S. Singh et al., AES investigation of annealing effects on the oxygen adsorbed Mn/Si(111) interface, APPL SURF S, 152(3-4), 1999, pp. 213-218