Authors: Kay, S Anberg, D Goodman, T Elenius, P

Citation: S. Kay et al., Analyzing issues for 300mm "backend" lithography, SOL ST TECH, 44(7), 2001, pp. 138

Authors: Anberg, D Flack, W

Citation: D. Anberg et W. Flack, Optical lithography aims for 157 nm, PHOTON SPEC, 34(12), 2000, pp. 74