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Results: 1-10 |
Results: 10
Determination of the EEDF by Langmuir probe diagnostics in a plasma excited at ECR above a multipolar magnetic field
Authors: Lagarde, T Arnal, Y Lacoste, A Pelletier, J
Citation: T. Lagarde et al., Determination of the EEDF by Langmuir probe diagnostics in a plasma excited at ECR above a multipolar magnetic field, PLASMA SOUR, 10(2), 2001, pp. 181-190
New trends in DECR plasma technology: applications to novel duplex treatments and process combinations with extreme plasma specifications
Authors: Pelletier, J Lacoste, A Arnal, Y Lagarde, T Lincot, C Hertz, D
Citation: J. Pelletier et al., New trends in DECR plasma technology: applications to novel duplex treatments and process combinations with extreme plasma specifications, SURF COAT, 139(2-3), 2001, pp. 222-232
New trends in PBII technology: industrial perspectives and limitations
Authors: Pelletier, J Le Coeur, F Arnal, Y Lacoste, A Straboni, A
Citation: J. Pelletier et al., New trends in PBII technology: industrial perspectives and limitations, SURF COAT, 136(1-3), 2001, pp. 7-15
PBII processing of dielectric layers: physical aspects limitations and experimental results
Authors: Lacoste, A Le Coeur, F Arnal, Y Pelletier, J Grattepain, C
Citation: A. Lacoste et al., PBII processing of dielectric layers: physical aspects limitations and experimental results, SURF COAT, 135(2-3), 2001, pp. 268-273
Influence of the process parameters on the properties of hydrogenated amorphous carbon thin films deposited using ECR plasma
Authors: Piazza, F Arnal, Y Grambole, D Herrmann, F Kildemo, M Lacoste, A Relihan, G Golanski, A
Citation: F. Piazza et al., Influence of the process parameters on the properties of hydrogenated amorphous carbon thin films deposited using ECR plasma, THIN SOL FI, 383(1-2), 2001, pp. 196-199
New applications of microwave-excited magnetron structures
Authors: Arnal, Y Lacoste, A Pelletier, J
Citation: Y. Arnal et al., New applications of microwave-excited magnetron structures, VIDE, 55(297), 2000, pp. 258
Ion implantation by plasma immersion: interest, limitations and perspectives
Authors: Le Coeur, F Pelletier, J Arnal, Y Lacoste, A
Citation: F. Le Coeur et al., Ion implantation by plasma immersion: interest, limitations and perspectives, SURF COAT, 125(1-3), 2000, pp. 71-78
New line of high voltage high current pulse generators for plasma-based ion implantation
Authors: Maulat, O Roche, M Le Coeur, F Lesaint, O Arnal, Y Pelletier, J
Citation: O. Maulat et al., New line of high voltage high current pulse generators for plasma-based ion implantation, J VAC SCI B, 17(2), 1999, pp. 879-882
Parametric study of the etching of SiO2 in SF6 plasmas: Modeling of the etching kinetics and validation
Authors: Lagarde, T Pelletier, J Arnal, Y
Citation: T. Lagarde et al., Parametric study of the etching of SiO2 in SF6 plasmas: Modeling of the etching kinetics and validation, J VAC SCI B, 17(1), 1999, pp. 118-126
Recent developments in DECR plasmas
Authors: Lagarde, T Pelletier, J Arnal, Y
Citation: T. Lagarde et al., Recent developments in DECR plasmas, J PHYS IV, 8(P7), 1998, pp. 121-132
Risultati: 1-10 |