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Authors: Feron, O Sugiyama, M Asawamethapant, W Futakuchi, N Feurprier, Y Nakano, Y Shimogaki, Y
Citation: O. Feron et al., MOCVD of InGaAsP, InGaAs and InGaP over InP and GaAs substrates: distribution of composition and growth rate in a horizontal reactor, APPL SURF S, 159, 2000, pp. 318-327
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