Authors:
Bourdelle, KK
Chen, YN
Ashton, RA
Rubin, LM
Agarwal, A
Morris, WH
Citation: Kk. Bourdelle et al., Evaluation of high dose, high energy boron implantation into Cz substratesfor epi-replacement in CMOS technology, IEEE DEVICE, 48(9), 2001, pp. 2043-2049