Login
|
New Account
AAAAAA
ITA
ENG
Results:
1-1
|
Results: 1
GATE OXIDE RELIABILITIES IN MOS (METAL-OXIDE-SEMICONDUCTOR) STRUCTURES WITH TI-POLYCIDE GATES
Authors:
KIM HS KO DH BAE DL LEE NI KIM DW KANG HK LEE MY
Citation:
Hs. Kim et al., GATE OXIDE RELIABILITIES IN MOS (METAL-OXIDE-SEMICONDUCTOR) STRUCTURES WITH TI-POLYCIDE GATES, Journal of electronic materials, 27(4), 1998, pp. 21-25
Risultati:
1-1
|