Authors:
COLLART EJH
WEEMERS K
COWERN NEB
POLITIEK J
BANCKEN PHL
VANBERKUM JGM
GRAVESTEIJN DJ
Citation: Ejh. Collart et al., LOW-ENERGY BORON IMPLANTATION IN SILICON AND ROOM-TEMPERATURE DIFFUSION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 139(1-4), 1998, pp. 98-107