Authors: COLLART EJH WEEMERS K COWERN NEB POLITIEK J BANCKEN PHL VANBERKUM JGM GRAVESTEIJN DJ

Citation: Ejh. Collart et al., LOW-ENERGY BORON IMPLANTATION IN SILICON AND ROOM-TEMPERATURE DIFFUSION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 139(1-4), 1998, pp. 98-107