Authors: BAO TI I L

Citation: Ti. Bao et L. I, THE EFFECT OF POST DEPOSITION LOW-ENERGY PLASMA BOMBARDMENT ON THE ULTRA-THIN HYDROGENATED SILICON-OXIDE FILMS, Journal of applied physics, 78(11), 1995, pp. 6852-6854

Authors: BAO TI TSAI SH I L

Citation: Ti. Bao et al., EFFECTS OF RF MAGNETRON PLASMA ON THE PARTICLE-SIZE DISTRIBUTION IN LASER-ABLATION DEPOSITION, Journal of applied physics, 78(1), 1995, pp. 489-493

Authors: CHEN TP BAO TI LIN I

Citation: Tp. Chen et al., SIO2 THIN-FILM DEPOSITION BY RADIO-FREQUENCY OXYGEN PLASMA-ENHANCED LASER-ABLATION FROM SI, Applied physics letters, 63(18), 1993, pp. 2475-2477