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Results: 1-11 |
Results: 11
COMPACT 600-W KRF LASER
Authors: BORISOV VM VINOKHODOV AY VODCHITS VA DEMIN AI ELTSOV AV BASTING D STAMM U VOSS F
Citation: Vm. Borisov et al., COMPACT 600-W KRF LASER, Quantum electronics, 28(2), 1998, pp. 119-122
OPERATIONAL STABILITY OF A COMPACT 600-W KRF LASER
Authors: BORISOV VM VINOKHODOV AY VODCHITS VA ELTSOV AV BASTING D STAMM U VOSS F
Citation: Vm. Borisov et al., OPERATIONAL STABILITY OF A COMPACT 600-W KRF LASER, Quantum electronics, 28(2), 1998, pp. 123-126
IT STARTED IN GRADUATE-SCHOOL, AND NEVER STOPPED
Authors: CHANG MMT BASTING D
Citation: Mmt. Chang et D. Basting, IT STARTED IN GRADUATE-SCHOOL, AND NEVER STOPPED, Photonics spectra, 32(2), 1998, pp. 30-31
ADVANCED ARF EXCIMER-LASER FOR 193 NM LITHOGRAPHY
Authors: LINDNER R STAMM U PATZEL R BASTING D
Citation: R. Lindner et al., ADVANCED ARF EXCIMER-LASER FOR 193 NM LITHOGRAPHY, Microelectronic engineering, 42, 1998, pp. 75-78
EXCIMER-LASER TECHNOLOGY OPENS DOORS FOR INDUSTRIAL INNOVATIONS
Authors: BASTING D
Citation: D. Basting, EXCIMER-LASER TECHNOLOGY OPENS DOORS FOR INDUSTRIAL INNOVATIONS, Photonics spectra, 30(1), 1996, pp. 99-99
EXCIMER-LASER WITH HIGH-REPETITION-RATE FOR DUV LITHOGRAPHY
Authors: PATZEL R BRAGIN I KLEINSCHMIDT J REBHAN U BASTING D
Citation: R. Patzel et al., EXCIMER-LASER WITH HIGH-REPETITION-RATE FOR DUV LITHOGRAPHY, Microelectronic engineering, 30(1-4), 1996, pp. 165-167
NEW KRF AND ARF EXCIMER LASERS FOR ADVANCED DEEP-ULTRAVIOLET OPTICAL LITHOGRAPHY
Authors: ENDERT H PATZEL R REBHAN U POWELL M BASTING D
Citation: H. Endert et al., NEW KRF AND ARF EXCIMER LASERS FOR ADVANCED DEEP-ULTRAVIOLET OPTICAL LITHOGRAPHY, JPN J A P 1, 34(8A), 1995, pp. 4050-4054
LONG-TERM GROWTH REQUIRES GLOBAL COOPERATION
Authors: BASTING D
Citation: D. Basting, LONG-TERM GROWTH REQUIRES GLOBAL COOPERATION, Laser focus, 31(6), 1995, pp. 55-56
EXCIMER-LASER - A NEW TOOL FOR PRECISION MICROMACHINING
Authors: ENDERT H PATZEL R BASTING D
Citation: H. Endert et al., EXCIMER-LASER - A NEW TOOL FOR PRECISION MICROMACHINING, Optical and quantum electronics, 27(12), 1995, pp. 1319-1335
NEW KRF AND ARF EXCIMER-LASER FOR ADVANCED DUV LITHOGRAPHY
Authors: ENDERT H PATZEL R POWELL M REBHAN U BASTING D
Citation: H. Endert et al., NEW KRF AND ARF EXCIMER-LASER FOR ADVANCED DUV LITHOGRAPHY, Microelectronic engineering, 27(1-4), 1995, pp. 221-224
EXCIMER LASERS - CURRENT STATUS AND FUTURE-DEVELOPMENTS
Authors: REBHAN U BASTING D
Citation: U. Rebhan et D. Basting, EXCIMER LASERS - CURRENT STATUS AND FUTURE-DEVELOPMENTS, Berichte der Bunsengesellschaft fur Physikalische Chemie, 97(12), 1993, pp. 1509-1511
Risultati: 1-11 |