Citation: L. Bauch et al., RESIST PROCESS TO JOIN ELECTRON-BEAM LITHOGRAPHY AND PHOTOLITHOGRAPHY, Microelectronic engineering, 27(1-4), 1995, pp. 371-374
Citation: M. Bottcher et al., SURFACE IMAGING BY SILYLATION FOR LOW-VOLTAGE ELECTRON-BEAM LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3473-3477
Citation: L. Bauch et al., DRY-ETCHING PATTERN TRANSFER OF 0.3 MU-M STRUCTURES IN TECHNOLOGICAL LAYERS USING TRANSMISSION PHASE MASKS, Microelectronic engineering, 23(1-4), 1994, pp. 377-380