ELECTRON-BEAM LITHOGRAPHY OVER TOPOGRAPHY

Authors
BAUCH L JAGDHOLD U BOTTCHER M
Citation
L. Bauch et al., ELECTRON-BEAM LITHOGRAPHY OVER TOPOGRAPHY, Microelectronic engineering, 30(1-4), 1996, pp. 53-56
Citations number
5
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
30
Issue
1-4
Year of publication
1996
Pages
53 - 56
Database
ISI
SICI code
0167-9317(1996)30:1-4<53:ELOT>2.0.ZU;2-P
Abstract
An investigation of electron beam lithography will be presented to str ucture resist over a topographical surface of a metallization layer. T he investigation shows the influence of different accelerating voltage s (2.5 and 20 kV) on resist profiles over topographical steps. Simulat ion methods are used to illustrate the experimental behaviour.