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Results:
1-8
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Results: 8
Authors:
SCORDO S
DUCARROIR M
BECHE E
BERJOAN R
Citation: S. Scordo et al., ON THE NATURE OF MICROWAVE DEPOSITED HARD SILICON-CARBON FILMS, Journal of materials research, 13(11), 1998, pp. 3315-3325
Authors:
VIARD J
BECHE E
PERARNAU D
BERJOAN R
DURAND J
Citation: J. Viard et al., XPS AND FTIR STUDY OF SILICON OXYNITRIDE THIN-FILMS, Journal of the European Ceramic Society, 17(15-16), 1997, pp. 2025-2028
Authors:
VIARD J
BECHE E
DURAND J
BERJOAN R
Citation: J. Viard et al., S1-H BONDING ENVIRONMENT IN PECVD A-SIOXNY-H THIN-FILMS, Journal of the European Ceramic Society, 17(15-16), 1997, pp. 2029-2032
Authors:
PERREM R
HENRY F
PERAUDEAU G
ARMAS B
BERJOAN R
BECHE E
Citation: R. Perrem et al., AN XPS AND THERMOGRAVIMETRIC STUDY OF OXIDIZED ALN AND ALN-SI3N2 LAYERS DEPOSITED BY LIQUID-PHASE CHEMICAL-VAPOR-DEPOSITION, Journal of Materials Science, 32(5), 1997, pp. 1305-1312
Authors:
BENDEDDOUCHE A
BERJOAN R
BECHE E
MERLEMEJEAN T
SCHAMM S
SERIN V
TAILLADES G
PRADEL A
HILLEL R
Citation: A. Bendeddouche et al., STRUCTURAL CHARACTERIZATION OF AMORPHOUS SICXNY CHEMICAL-VAPOR-DEPOSITED COATINGS, Journal of applied physics, 81(9), 1997, pp. 6147-6154
Authors:
BERGER F
BECHE E
BERJOAN R
KLEIN D
CHAMBAUDET A
Citation: F. Berger et al., AN XPS AND FTIR STUDY OF SO2 ADSORPTION ON SNO2 SURFACES, Applied surface science, 93(1), 1996, pp. 9-16
Authors:
BENDEDDOUCHE A
BERJOAN R
BECHE E
SCHAMM S
SERIN V
CARLES R
HILLEL R
Citation: A. Bendeddouche et al., SICN AMORPHOUS MATERIALS CHEMICAL-VAPOR-DEPOSITED USING THE SI(CH3)(4)-NH3-H-2 SYSTEM, Journal de physique. IV, 5(C5), 1995, pp. 793-800
Authors:
BECHE E
BERJOAN R
VIARD J
CROS B
DURAND J
Citation: E. Beche et al., XPS AND AES CHARACTERIZATION OF SINX-H LAYERS DEPOSITED BY PECVD ON PARYLENE-C - EFFECTS OF THERMAL TREATMENTS ON PARYLENE-C SURFACES AND PARYLENE-C SINX-H INTERLAYERS, Thin solid films, 258(1-2), 1995, pp. 143-150
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