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Citation: L. Kaabi et al., THE RESIDUAL ELECTRICALLY ACTIVE DAMAGE IN LOW-ENERGY BORON-IMPLANTEDSILICON - RAPID THERMAL ANNEALING AND IMPLANT MASS EFFECTS, EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 3(1), 1998, pp. 49-52

Authors: KAABI L GONTRAND C BUREAU JC SASSI Z BENBRAHIM J BALLAND B

Citation: L. Kaabi et al., RTA PROCESSING OF IONIC BORON-IMPLANTED IN SILICON THROUGH SCREEN OXIDE-FILMS - EFFECTS OF SOME TECHNOLOGICAL PARAMETERS, Annales de chimie, 23(1-2), 1998, pp. 359-364

Authors: AMARA ABH BENBRAHIM J PLANCON A BENRHAIEM H

Citation: Abh. Amara et al., X-RAY-DIFFRACTION OF HYDRATED AND DEHYDRATED NACRITE STACKING MODES, Journal of applied crystallography, 31, 1998, pp. 654-662

Authors: AMARA AB BENBRAHIM J PLANCON A BENRHAIEM H BESSON G

Citation: Ab. Amara et al., STRUCTURAL STUDY OF A TUNISIAN NACRITE, Journal of applied crystallography, 30, 1997, pp. 338-344

Authors: AMARA AB BENBRAHIM J BENAYED N BENRHAIEM H

Citation: Ab. Amara et al., PRESENCE OF NACRITE IN OLD LEAD-ZINC BEDS OF NORTHERN TUNISIA, Clay Minerals, 31(1), 1996, pp. 127-130

Authors: AMARA AB BENBRAHIM J BESSON G PONS CH

Citation: Ab. Amara et al., ANALYSIS OF NACRITE INTERCALATED WITH DIM ETHYLSULFOXIDE AND N-METHYLACETAMIDE, Clay Minerals, 30(4), 1995, pp. 295-306