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Results: 4

Authors: KLOSNER MA BENDER HA SILFVAST WT ROCCA JJ
Citation: Ma. Klosner et al., INTENSE PLASMA DISCHARGE SOURCE AT 13.5 NM FOR EXTREME-ULTRAVIOLET LITHOGRAPHY, Optics letters, 22(1), 1997, pp. 34-36

Authors: BENDER HA OCONNELL D SILFVAST WT
Citation: Ha. Bender et al., VELOCITY CHARACTERIZATION OF PARTICULATE DEBRIS FROM LASER-PRODUCED PLASMAS USED FOR EXTREME-ULTRAVIOLET LITHOGRAPHY, Applied optics, 34(28), 1995, pp. 6513-6521

Authors: RICHARDSON M SILFVAST WT BENDER HA HANZO A YANOVSKY VP JIN F THORPE J
Citation: M. Richardson et al., CHARACTERIZATION AND CONTROL OF LASER-PLASMA FLUX PARAMETERS FOR SOFT-X-RAY PROJECTION LITHOGRAPHY, Applied optics, 32(34), 1993, pp. 6901-6910

Authors: BENDER HA SILFVAST WT BECK KM SINGH RK
Citation: Ha. Bender et al., INVESTIGATION OF DISTORTION AND DAMAGE OF MOLYBDENUM SILICON MULTILAYER REFLECTIVE COATINGS WITH HIGH-INTENSITY ULTRAVIOLET-RADIATION, Applied optics, 32(34), 1993, pp. 6999-7006
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