AAAAAA

   
Results: 1-8 |
Results: 8
INFLUENCE OF O-2 AND H2O2 ON THE METALLIC CONTAMINATION PROCESS OF SILICON-WAFERS IN DILUTE HF SOLUTIONS
Authors: BERTAGNA V ROUELLE F CHEMLA M
Citation: V. Bertagna et al., INFLUENCE OF O-2 AND H2O2 ON THE METALLIC CONTAMINATION PROCESS OF SILICON-WAFERS IN DILUTE HF SOLUTIONS, Semiconductor science and technology, 13(4), 1998, pp. 444-452
KINETICS OF ELECTROCHEMICAL CORROSION OF SILICON-WAFERS IN DILUTE HF SOLUTIONS
Authors: BERTAGNA V PLOUGONVEN C ROUELLE F CHEMLA M
Citation: V. Bertagna et al., KINETICS OF ELECTROCHEMICAL CORROSION OF SILICON-WAFERS IN DILUTE HF SOLUTIONS, Journal of electroanalytical chemistry [1992], 422(1-2), 1997, pp. 115-123
COPPER CONTAMINATION MECHANISM OF SILICON SUBSTRATES FROM HF SOLUTIONS
Authors: BERTAGNA V ROUELLE F CHEMLA M
Citation: V. Bertagna et al., COPPER CONTAMINATION MECHANISM OF SILICON SUBSTRATES FROM HF SOLUTIONS, Zeitschrift fur Naturforschung. A, A journal of physical sciences, 52(6-7), 1997, pp. 465-476
AN IMPROVED ELECTROCHEMICAL-CELL FOR THE CHARACTERIZATION OF SILICON ELECTROLYTE INTERFACES/
Authors: BERTAGNA V ROUELLE F CHEMLA M
Citation: V. Bertagna et al., AN IMPROVED ELECTROCHEMICAL-CELL FOR THE CHARACTERIZATION OF SILICON ELECTROLYTE INTERFACES/, Journal of Applied Electrochemistry, 27(10), 1997, pp. 1179-1183
ELECTROCHEMICAL AND RADIOCHEMICAL STUDY OF COPPER CONTAMINATION MECHANISM FROM HF SOLUTIONS ONTO SILICON SUBSTRATES
Authors: BERTAGNA V ROUELLE F REVEL G CHEMLA M
Citation: V. Bertagna et al., ELECTROCHEMICAL AND RADIOCHEMICAL STUDY OF COPPER CONTAMINATION MECHANISM FROM HF SOLUTIONS ONTO SILICON SUBSTRATES, Journal of the Electrochemical Society, 144(12), 1997, pp. 4175-4182
NEW ELECTROCHEMICAL-CELL FOR THE STUDY OF METALLIC SURFACES - CHARACTERIZATION OF SILICON ELECTROLYTE INTERFACE/
Authors: BERTAGNA V ROUELLE F CHEMLA M
Citation: V. Bertagna et al., NEW ELECTROCHEMICAL-CELL FOR THE STUDY OF METALLIC SURFACES - CHARACTERIZATION OF SILICON ELECTROLYTE INTERFACE/, Analusis, 24(9-10), 1996, pp. 383-386
P-TYPE AND N-TYPE SILICON ELECTROCHEMICAL PROPERTIES IN DILUTE HYDROFLUORIC-ACID SOLUTIONS
Authors: BERTAGNA V PLOUGONVEN C ROUELLE F CHEMLA M
Citation: V. Bertagna et al., P-TYPE AND N-TYPE SILICON ELECTROCHEMICAL PROPERTIES IN DILUTE HYDROFLUORIC-ACID SOLUTIONS, Journal of the Electrochemical Society, 143(11), 1996, pp. 3532-3538
PROBING BY IN-SITU SCANNING-TUNNELING-MICROSCOPY THE INFLUENCE OF AN ORGANIC ADDITIVE ON SI ETCHING IN NAOH
Authors: ALLONGUE P BERTAGNA V KIELING V GERISCHER H
Citation: P. Allongue et al., PROBING BY IN-SITU SCANNING-TUNNELING-MICROSCOPY THE INFLUENCE OF AN ORGANIC ADDITIVE ON SI ETCHING IN NAOH, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(3), 1994, pp. 1539-1542
Risultati: 1-8 |