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Results:
1-7
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Results: 7
Authors:
KOULIDIATI J
CZERNICHOWSKI A
BEULENS JJ
SCHRAM DC
Citation: J. Koulidiati et al., DIAGNOSTICS OF A HYDROCARBON PLASMA-JET USING THE A(2)DELTA-X-2-PI SYSTEM OF CH, Acta Physica Polonica. A, 94(1), 1998, pp. 3-12
Authors:
MATSUO PJ
KASTENMEIER BEE
BEULENS JJ
OEHRLEIN GS
Citation: Pj. Matsuo et al., ROLE OF N-2 ADDITION ON CF4 O-2 REMOTE PLASMA CHEMICAL DRY-ETCHING OFPOLYCRYSTALLINE SILICON/, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(4), 1997, pp. 1801-1813
Authors:
RUEGER NR
BEULENS JJ
SCHAEPKENS M
DOEMLING MF
MIRZA JM
STANDAERT TEFM
OEHRLEIN GS
Citation: Nr. Rueger et al., ROLE OF STEADY-STATE FLUOROCARBON FILMS IN THE ETCHING OF SILICON DIOXIDE USING CHF3 IN AN INDUCTIVELY-COUPLED PLASMA REACTOR, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(4), 1997, pp. 1881-1889
Authors:
KASTENMEIER BEE
MATSUO PJ
BEULENS JJ
OEHRLEIN GS
Citation: Bee. Kastenmeier et al., CHEMICAL DRY-ETCHING OF SILICON-NITRIDE AND SILICON DIOXIDE USING CF4O-2/N-2 GAS-MIXTURES/, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(5), 1996, pp. 2802-2813
Authors:
BEULENS JJ
KASTENMEIER BEE
MATSUO PJ
OEHRLEIN GS
Citation: Jj. Beulens et al., CHEMICAL DOWNSTREAM ETCHING OF SILICON-NITRIDE AND POLYCRYSTALLINE SILICON USING CF4 O-2/N-2 - SURFACE CHEMICAL EFFECTS OF O-2 AND N-2 ADDITIVES/, Applied physics letters, 66(20), 1995, pp. 2634-2636
Authors:
BEULENS JJ
GASTINEAU C
GUERRASSIMOV N
KOULIDIATI J
SCHRAM DC
Citation: Jj. Beulens et al., ATOMIC AND MOLECULAR-EMISSION SPECTROSCOPY ON AN EXPANDING ARGON METHANE PLASMA, Plasma chemistry and plasma processing, 14(1), 1994, pp. 15-42
Authors:
BUURON AJM
MEEUSEN GJ
BEULENS JJ
VANDESANDEN MCM
SCHRAM DC
Citation: Ajm. Buuron et al., FAST DEPOSITION OF AMORPHOUS-CARBON AND SILICON LAYERS, Journal of nuclear materials, 200(3), 1993, pp. 430-433
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