Authors: TARASCON RG NOVEMBRE AE BOLAN K BLAKEY M KNUREK C FETTER L HUGGINS HA LIDDLE JA NALAMASU O

Citation: Rg. Tarascon et al., LITHOGRAPHIC EVALUATION OF A POSITIVE-ACTING CHEMICALLY AMPLIFIED RESIST SYSTEM UNDER CONVENTIONAL AND PROJECTION ELECTRON-BEAM EXPOSURES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2975-2979

Authors: TARASCON RG BOLAN K BLAKEY M CAMARDA RM FARROW RC FETTER LA HUGGINS HA KRAUS JS LIDDLE JA MIXON DA NOVEMBRE AE WATSON GP BERGER SD

Citation: Rg. Tarascon et al., LITHOGRAPHIC PERFORMANCE OF A NEGATIVE RESIST UNDER SCATTERING WITH ANGULAR LIMITATION FOR PROJECTION ELECTRON LITHOGRAPHY EXPOSURE AT 100 KEV, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3444-3448