LITHOGRAPHIC PERFORMANCE OF A NEGATIVE RESIST UNDER SCATTERING WITH ANGULAR LIMITATION FOR PROJECTION ELECTRON LITHOGRAPHY EXPOSURE AT 100 KEV

TARASCON RG BOLAN K BLAKEY M CAMARDA RM FARROW RC FETTER LA HUGGINS HA KRAUS JS LIDDLE JA MIXON DA NOVEMBRE AE WATSON GP BERGER SD

Rg. Tarascon et al., LITHOGRAPHIC PERFORMANCE OF A NEGATIVE RESIST UNDER SCATTERING WITH ANGULAR LIMITATION FOR PROJECTION ELECTRON LITHOGRAPHY EXPOSURE AT 100 KEV, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3444-3448

8

Physics, Applied

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP

10711023

12

6

1994

3444 - 3448

ISI

1071-1023(1994)12:6<3444:LPOANR>2.0.ZU;2-8